Microelectronics Technology: Polymers for Advanced Imaging and Packaging (ACS Symposium Series)

By Reichmanis

Provides an up-to-date assessment of chemically amplified resist materials chemistry and process considerations. Reports novel chemistry for single layer 193nm lithographic applications. Discusses new approaches to silicon-containing resists and multilevel processes. Explores the design of low-dielectric polymer materials for microelectronic applications.

• Format: Hardcover
• Language: English
• ISBN: 0841233322
• ISBN13: 9780841233324
• Release Date: May 1995
• Publisher: American Chemical Society
• Length: 590 Pages
• Weight: 1.90 lbs.
• Dimensions: 9.5" x 1.3" x 6.3"