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Microelectronics Technology: Polymers for Advan...

Edition Description

Provides an up-to-date assessment of chemically amplified resist materials chemistry and process considerations. Reports novel chemistry for single layer 193nm lithographic applications. Discusses new approaches to silicon-containing resists and multilevel processes. Explores...

Edition Details

Format:Hardcover

Language:English

ISBN:0841233322

Format: Hardcover

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Microelectronics Technology: Polymers for Advan...

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