Design a Slit HDP Semiconductor Plasma Dry Etcher

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Design a Slit HDP Semiconductor Plasma Dry Etcher

Edition Description

In order to overcome the difficulties of the manufacturing procedures, the novel concept of slit shape HDP plasma dry etching of metal roller from semiconductor IC process is proposed and applied to a patent.

Edition Details

Format:Paperback

Language:English

ISBN:B08MX125WP

Format: Paperback

Condition:

85.66

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List Price: ~~$99.99~~

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Design a Slit HDP Semiconductor Plasma Dry Etcher

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