Sensor-based Modeling and Monitoring of Chemical Mechanical Polishing

By Prahalada Rao

This book provides a framework for real time control of the Chemical Mechanical Planarization (CMP) process based on combining nonlinear dynamics principles with statistical process monitoring... This description may be from another edition of this product.

• Format: Paperback
• Language: English
• ISBN: 363903564X
• ISBN13: 9783639035643
• Release Date: December 2008
• Publisher: VDM Verlag
• Length: 208 Pages
• Weight: 0.63 lbs.
• Dimensions: 0.4" x 6.0" x 9.0"