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Plasma Sources for Thin Film Deposition and Etc...

Edition Description

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing...

Edition Details

Format:Hardcover

Language:English

ISBN:0125330189

Format: Hardcover

Condition:

56.49

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Plasma Sources for Thin Film Deposition and Etc...

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