Plasma Sources for Thin Film Deposition and Etching: Volume 18

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.

• Format: Hardcover
• Language: English
• ISBN: 0125330189
• ISBN13: 9780125330183
• Release Date: September 1994
• Publisher: Academic Press
• Length: 328 Pages
• Weight: 1.65 lbs.
• Dimensions: 0.8" x 6.0" x 9.0"