Plasma Etching: Fundamentals and Applications

By M. Sugawara

This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.

• Format: Hardcover
• Language: English
• ISBN: 019856287X
• ISBN13: 9780198562870
• Release Date: July 1998
• Publisher: OUP Oxford
• Length: 356 Pages
• Weight: 1.45 lbs.
• Dimensions: 0.8" x 6.1" x 9.2"