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Plasma-enhanced atomic layer deposition of high... 6209554733 Book Cover

Plasma-enhanced atomic layer deposition of high...

Edition Description

This book investigates the processes and methods for preparing high-quality gallium nitride thin films on different substrates using plasma-enhanced atomic layer deposition technology. By introducing an aluminum nitride interlayer and nitrogen plasma pretreatment on silicon substrates,...

Edition Details
Format:Paperback
Language:English
ISBN:6209554733
Format: Paperback
Condition:
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