Photoreactive Polymers: The Science and Technology of Resists

By Arnost Reiser

Basic mechanisms and applications of photoresist chemistry in semiconductor device manufacturing, lithography, chemical engineering, and the graphic arts are discussed in this book.

• Format: Paperback
• Language: English
• ISBN: 0471855502
• ISBN13: 9780471855507
• Release Date: January 1989
• Publisher: Wiley-Interscience
• Length: 409 Pages
• Weight: 1.60 lbs.
• Dimensions: 2.6" x 1.0" x 1.6"