Nanolithography: A Borderland Between Stm, Eb, Ib, and X-Ray Lithographies

By M. Gentili

Book Overview

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).

• Format: Hardcover
• Language: English
• ISBN: 0792327942
• ISBN13: 9780792327943
• Release Date: April 1994
• Publisher: Springer
• Length: 216 Pages
• Weight: 1.11 lbs.
• Dimensions: 0.6" x 6.1" x 9.2"