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Machine Learning-Based Modelling in Atomic Layer Deposition Processes
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Machine Learning-Based Modelling in Atomic Laye... 1032386703 Book Cover

Machine Learning-Based Modelling in Atomic Laye...

By , ,
Edition Description

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

Edition Details
Format:Hardcover
Language:English
ISBN:1032386703
Format: Hardcover
Condition:
$
249.99
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