Ion Implantation and Synthesis of Materials

By Michael Nastasi and James W. Mayer

Book Overview

General Features and Fundamental Concepts.- Particle Interactions.- Dynamics of Binary Elastic Collisions.- Cross-Section.- Ion Stopping.- Ion Range and Range Distribution.- Displacements and Radiation Damage.- Channeling.- Doping, Diffusion and Defects in Ion-Implanted Si.- Crystallization and Regrowth of Amorphous Si.- Si Slicing and Layer Transfer: Ion-Cut.- Surface Erosion During Implantation: Sputtering.- Ion-Induced Atomic Intermixing at the Interface: Ion Beam Mixing.- Application of Ion Implantation Techniques in CMOS Fabrication.- Ion implantation in CMOS Technology: Machine Challenges.

• Format: Paperback
• Language: English
• ISBN: 3642062598
• ISBN13: 9783642062599
• Release Date: February 2010
• Publisher: Springer
• Length: 263 Pages
• Weight: 0.87 lbs.
• Dimensions: 0.6" x 6.1" x 9.2"