Interconnect Noise Optimization in Nanometer Technologies

By Magdy A. Bayoumi and Mohamed A. Elgamel

This book provides insight into the use of CAD for layout analysis and optimization of interconnect in high speed, high complexity integrated circuits, which have become the dominating factor in determining system performance in nanometer technologies. The text investigates the effects on system performance and reliability of wire size, spacing, wire length, coupling length, load capacitance, rise time of the inputs, place of overlap, frequency, shields, signal direction and wire width for both the aggressors and the victim wires. The authors present a range of CAD algorithms and techniques for synthesizing and optimizing interconnect.

• Format: Hardcover
• Language: English
• ISBN: 0387258701
• ISBN13: 9780387258706
• Release Date: November 2005
• Publisher: Springer
• Length: 137 Pages
• Weight: 1.15 lbs.
• Dimensions: 0.7" x 6.4" x 9.5"