High Vacuum Production in the Micro-Electronic Industry (Plasma Technology, No 2)

By Pierre Duval

Classical applications of vacuum in the semiconductor industry have until recently involved only inert and clean gases. This situation has changed radically because the new technologies, used for deposition (LPCVD...) as well as for plasma etching, all involve the use of dangerous, poisonous, toxic or/and corrosive gases. Both the users and the manufacturers of vacuum pumps are now faced with new problems involving: Personnel safety and environment protection; Corrosion in vacuum pumps and peripherals; Reliability and serviceability of the equipment; In situ dust contamination of processed wafers, etc. This volume provides the first complete user oriented overview of all the problems that may be encountered with vacuum systems during semiconductor wafer processing. An up-to-date report of oil free vacuum pumps is also included.

• Format: Hardcover
• Language: English
• ISBN: 044442878x
• ISBN13: 9780444428783
• Release Date: January 1988
• Publisher: Elsevier Science Ltd
• Length: 236 Pages
• Weight: 1.30 lbs.
• Dimensions: 9.8" x 0.8" x 6.8"