High Numerical Aperture EUV Lithography

By XI SHAN

As the semiconductor industry relentlessly pursues the limits of miniaturization, High Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) Lithography emerges as the pivotal technology enabling feature sizes below 3nm. This comprehensive textbook serves as an indispensable resource for professionals and researchers aiming to master the complexities of High-NA EUV lithography.

Unlock the Future of Nanolithography with This Definitive Guide

Deep Dive into Optical Principles: Explore how numerical aperture influences resolution and depth of focus. Understand the physics of imaging at high NA and the challenges of achieving it in reflective optical systems. Advanced Optics Design & Manufacturing: Gain insights into designing projection optics for high-NA systems, including mirror surface optimization, multilayer coatings, and aberration control crucial for maintaining imaging fidelity. Cutting-Edge Resist Materials: Discover novel resist chemistries tailored for sub-3nm patterning. Examine the trade-offs between sensitivity, resolution, and line edge roughness (LER), and learn about innovative materials like metal-oxide and molecular resists. Simulation & Modeling Techniques: Delve into advanced simulation tools essential for predicting process outcomes. From aerial image simulation to full-chip modeling, equip yourself with the methodologies that guide design-for-manufacturing practices. Integration into Manufacturing Processes: Understand how High-NA EUV lithography fits into existing semiconductor fabrication workflows. Learn about process adjustments, compatibility with other patterning techniques, and strategies for throughput optimization. Overcoming Technical Challenges: Address critical issues such as overlay accuracy, thermal management, contamination control, and stochastic effects. Explore solutions for pellicle integration, mask defectivity, and process stability.

Who Will Benefit from This Textbook?

Semiconductor process engineers and lithographers seeking to implement High-NA EUV technology.Optical engineers focused on the design and optimization of high-precision projection optics.Materials scientists developing next-generation photoresists and photomask materials.Researchers and academics studying advanced nanofabrication and patterning techniques.

Equip yourself with the knowledge and tools to navigate the next era of semiconductor fabrication. With detailed explanations, practical examples, and insights into the latest research and development, this textbook is your gateway to mastering High-NA EUV lithography.

• Format: Paperback
• Language: English
• ISBN: B0DSQ7WXW3
• ISBN13: 9798306519869
• Release Date: January 2025
• Publisher: Independently Published
• Length: 308 Pages
• Weight: 0.91 lbs.
• Dimensions: 0.7" x 6.0" x 9.0"