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Paperback High-k Gate Dielectrics and Diffusion Barriers in Cu Metallization Book

ISBN: 3659134368

ISBN13: 9783659134364

High-k Gate Dielectrics and Diffusion Barriers in Cu Metallization

Scaling of silicon technology has entered an era of material limited device scaling , as fundamental physical limits have been reached with traditional CMOS materials. At the heart of the silicon... This description may be from another edition of this product.

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Format: Paperback

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