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Hf-Based High-K Dielectrics: Process Developmen... 3031014243 Book Cover

Hf-Based High-K Dielectrics: Process Developmen...

Edition Description

In this work, the reliability of HfO2 (hafnium oxide) with poly gate and dual metal gate electrode (Ru-Ta alloy, Ru) was investigated. Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. Dynamic stressing has also been...

Edition Details
Format:Paperback
Language:English
ISBN:3031014243
Format: Paperback
Condition:
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