Hf-Based High-K Dielectrics

By Young-Hee Kim and Jack C. Lee

In this work, the reliability of HfO2 (hafnium oxide) with poly gate and dual metal gate electrode (Ru-Ta alloy, Ru) was investigated. Hard breakdown and soft breakdown, particularly the Weibull... This description may be from another edition of this product.

• Format: Paperback
• Language: English
• ISBN: 1598290045
• ISBN13: 9781598290042
• Release Date: September 2005
• Publisher: Morgan & Claypool
• Length: 104 Pages
• Weight: 0.43 lbs.
• Dimensions: 0.2" x 7.5" x 9.3"