Gate Stack and Silicide Issues in Silicon Processing: Volume 611 (MRS Proceedings)

As the feature size of microelectronic devices approaches the deep submicron regime, the process development and integration issues related to gate stack and silicide processing are key challenges.... This description may be from another edition of this product.

• Format: Hardcover
• Language: English
• ISBN: 1558995196
• ISBN13: 9781558995192
• Release Date: March 2001
• Publisher: Cambridge University Press
• Length: 256 Pages
• Weight: 1.12 lbs.
• Dimensions: 9.0" x 0.8" x 6.0"