Fundamentals of III-V Semiconductor MOSFETs

Book Overview

Non-Silicon MOSFET Technology: A Long Time Coming.- Properties and Trade-Offs of Compound Semiconductor MOSFETs.- Device Physics and Performance Potential of III-V Field-Effect Transistors.- Theory of HfO2-Based High-k Dielectric Gate Stacks.- Density Functional Theory Simulations of High-k Oxides on III-V Semiconductors.- Interfacial Chemistry of Oxides on III-V Compound Semiconductors.- Atomic-Layer Deposited High-k/III-V Metal-Oxide-Semiconductor Devices and Correlated Empirical Model.- Materials and Technologies for III-V MOSFETs.- InGaAs, Ge, and GaN Metal-Oxide-Semiconductor Devices with High-k Dielectrics for Science and Technology Beyond Si CMOS.- Sub-100 nm Gate III-V MOSFET for Digital Applications.- Electrical and Material Characteristics of Hafnium Oxide with Silicon Interface Passivation on III-V Substrate for Future Scaled CMOS Technology.- p-type Channel Field-Effect Transistors.- Insulated Gate Nitride-Based Field Effect Transistors.- Technology/Circuit Co-Design for III-V FETs.

• Format: Hardcover
• Language: English
• ISBN: 144191546X
• ISBN13: 9781441915467
• Release Date: March 2010
• Publisher: Springer
• Length: 445 Pages
• Weight: 1.81 lbs.
• Dimensions: 1.0" x 6.1" x 9.2"