Fluid handling structure, a lithographic apparatus and a device manufacturing method: United States Patent 9971255

By: Cortie, Rogier Hendrikus Magdalena

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

• Format: Paperback
• Language: English
• ISBN: B08RH17G9Z
• ISBN13: 9798584467333
• Release Date: January 1
• Publisher: Independently Published
• Length: 26 Pages
• Weight: 0.19 lbs.
• Dimensions: 0.1" x 8.5" x 11.0"