Computational Lithography and Optical Proximity Correction: With Python

By XI SHAN

Unlock the complexities of modern semiconductor manufacturing with this comprehensive guide to computational lithography and optical proximity correction (OPC). Designed for professionals and advanced students, this textbook bridges the gap between theoretical foundations and practical applications, offering a deep dive into the advanced modeling, simulation, and optimization techniques that drive today's cutting-edge lithographic processes.

In-Depth Exploration of Advanced Computational Models: Delve into sophisticated mathematical frameworks, including electromagnetic wave propagation, interference effects, and rigorous diffraction analysis. Understand how these models contribute to accurate prediction and enhancement of lithographic imaging. Hands-On Python Code Snippets: Gain practical experience with 33 Python code examples that implement key algorithms in OPC, inverse lithography technology (ILT), and source mask optimization (SMO). For instance, learn how to: Implement model-based OPC algorithms to correct proximity effects in complex layouts.Simulate electromagnetic wave propagation using Python libraries to visualize and quantify image distortions.Apply machine learning techniques to enhance OPC processes, such as pattern recognition and predictive modeling. Cutting-Edge Techniques and Applications: Stay abreast of the latest developments in the field, including: Strategies for computational lithography in extreme ultraviolet (EUV) processes, addressing unique challenges like stochastic effects and resist limitations.Advanced resolution enhancement techniques (RET) such as phase-shifting masks and off-axis illumination, with discussions on their computational implications.Process-aware OPC that integrates downstream effects like etching and deposition into lithography models, improving pattern fidelity.

This textbook not only provides theoretical insights but also emphasizes practical solutions to computational challenges. Learn how to optimize algorithms for speed and accuracy, manage large-scale data in full-chip OPC processing, and utilize parallel computing to accelerate simulations.

Empower yourself with the knowledge and tools to tackle the most challenging aspects of lithography and OPC. Whether you're involved in semiconductor manufacturing, research, or advanced studies, this book is an indispensable resource that will enhance your understanding and capabilities in the field.

• Format: Paperback
• Language: English
• ISBN: B0DSQ8WSP5
• ISBN13: 9798306526201
• Release Date: January 2025
• Publisher: Independently Published
• Length: 306 Pages
• Weight: 0.91 lbs.
• Dimensions: 0.6" x 6.0" x 9.0"