Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications

by Arthur Sherman

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics and kinetics, as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

• Format: Hardcover
• Language: English
• ISBN: 0815511361
• ISBN13: 9780815511366
• Release Date: January 1987
• Publisher: William Andrew
• Length: 226 Pages
• Weight: 0.57 lbs.
• Dimensions: 0.6" x 6.0" x 9.0"