Atomic Layer Deposition in Membrane Modification for Water Treatment and Gas Separation: Concepts, Applications, and Challenges

By Ngozi Enemuo, Tien-Chien Jen, Kingsley Ukoba

Atomic Layer Deposition (ALD) is an emerging gas-phase deposition process that offers several advantages over conventional deposition methods. However, despite its benefits, reports on its application in membrane modification are minimal.

This book focuses on the use of ALD as a membrane modification approach for improved separation applications across various fields. It starts with an introduction to membrane science and ALD chemistry, followed by a detailed examination of the application of ALD in modifying polymeric, ceramic, and hybrid membranes. The text covers applications in reverse osmosis, nanofiltration, ultrafiltration, membrane distillation, and various gas separation technologies, including CO₂ capture, hydrogen purification, and hydrocarbon separations.

This book integrates fundamental concepts, recent research, and practical knowledge in the field of membrane technology and is a useful resource for industrialists, researchers, and advanced graduate students working or entering the field.

• Format: Hardcover
• Language: English
• ISBN: 3032342260
• ISBN13: 9783032342263
• Release Date: September 2026
• Publisher: Springer
• Length: 282 Pages