Atomic Layer Deposition: Chemistry, Processing, and Applications

Atomic Layer Deposition: Chemistry, Processing, and Applications offers a systematic overview of ALD, highlighting its scientific foundations, surface chemistry, and processing techniques. The book explores the origin and evolution of ALD, along with its key applications across various fields, making it an essential reference for understanding this versatile technology. The book is organized into four main parts: Fundamentals of ALD, ALD in Semiconductors, Heterogeneous Catalysis, and Emerging Applications. It covers topics such as precursors, characterization methods, and advanced processing strategies. Readers will find detailed insights into ALD's role in memory devices, interconnects, catalysts, energy storage, photovoltaics, water treatment, and innovative fields like additive manufacturing and pharmaceuticals.

Atomic Layer Deposition: Chemistry, Processing, and Applications is an invaluable resource for researchers, engineers, and students in chemistry, physics, materials science, nanotechnology, and related disciplines.

• Format: Paperback
• Language: English
• ISBN: 0443444137
• ISBN13: 9780443444135
• Release Date: April 2027
• Publisher: Elsevier
• Length: 500 Pages
• Weight: 0.99 lbs.