Atomic Layer Deposition Applications 6 : ECS Transactions: Volume 33, Issue 2

The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the focus of this reoccurring symposium. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topographies with controlled thickness and composition. This issue of ECS Transactions contains peer reviewed papers presented at the symposium. A broad spectrum of ALD applications is featured, including novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics, and a variety of other emerging applications.

• Format: Hardcover
• Language: English
• ISBN: 1566778212
• ISBN13: 9781566778213
• Release Date: October 2010
• Publisher: Electrochemical Society, The
• Length: 455 Pages