Atomic Layer Deposition (ALD): Fundamentals, Characteristics and Industrial Applications (Chemical Engineering Methods and Technology)

By: Jeannie Valdez

Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of SiO2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD.

• Format: Hardcover
• Language: English
• ISBN: 1634838696
• ISBN13: 9781634838696
• Release Date: December 2015
• Publisher: Nova Science Pub Inc
• Length: 175 Pages
• Weight: 1.10 lbs.
• Dimensions: 10.3" x 0.5" x 7.3"