Advanced Processes for 193-nm Immersion Lithography

By Robert L. Brainard and Yayi Wei

This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current... This description may be from another edition of this product.

• Format: Hardcover
• Language: English
• ISBN: 0819475572
• ISBN13: 9780819475572
• Release Date: February 2009
• Publisher: SPIE--The International Society for Optical Engineering
• Length: 336 Pages
• Weight: 2.15 lbs.
• Dimensions: 10.0" x 0.8" x 7.0"