Plasma Processing for Semiconductor Materials and Thin-Film Devices

Plasma Processing for Semiconductor Materials and Thin-Film Devices brings together the state-of-the art and the latest developments in the field of plasma processing of thin films. It focuses on fundamental plasma theory, plasma for advanced applications and advanced characterization techniques, plasma and performance of semiconductor devices, and plasma processing. The book provides an overdue investigation of the most recent developments in the area of plasma processing. It begins by considering the fundamental physics of plasma, then moves to advanced applications in processing of semiconductor materials and their relation to performance of semiconductor thin film devices. Subsequently it investigates the adoption of plasma for advanced (including thin film) characterization methods, and finally it addresses emerging plasma technologies such as liquid plasma, cold atmospheric plasma, and other advanced plasma techniques for thin film applications (such as energy, sensor, and environmental). This book will be of interest to students, researchers, and practitioners in any field that utilizes plasma processing, since its chapters have been written by leading authorities from both academia and industry.

• Format: Paperback
• Language: English
• ISBN: 0443277419
• ISBN13: 9780443277412
• Release Date: November 2026
• Publisher: Elsevier
• Length: 900 Pages
• Weight: 0.99 lbs.