Glow-Discharge Hydrogenated Amorphous Silicon

By K. Tanaka

A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin

• Format: Hardcover
• Language: English
• ISBN: 0792303091
• ISBN13: 9780792303091
• Release Date: November 1989
• Publisher: Springer
• Length: 277 Pages
• Weight: 1.29 lbs.
• Dimensions: 0.7" x 6.1" x 9.2"